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DMD powers high-resolution lithography

With over 8.9 million micromirrors, TI’s DLP991UUV digital micromirror device (DMD) enables maskless digital lithography for advanced packaging. Its 4096×2176 micromirror array, 5.4-µm pitch, and 110-Gpixel/s data rate remove the need for costly mask technology while providing scalability and precision for increasingly complex designs.

The DMD is a spatial light modulator that controls the amplitude, direction, and phase of incoming light. Paired with the DLPC964 controller, the DLP991UUV DMD supports high-speed continuous data streaming for laser direct imaging. Its resolution enables large 3D-print build sizes, fine feature detail, and scanning of larger objects in 3D machine vision applications.

Offering the highest resolution and smallest mirror pitch in TI’s Digital Light Processing (DLP) portfolio, the DLP991UUV provides precise light control for industrial, medical, and consumer applications. It steers UV wavelengths from 343 nm to 410 nm and delivers up to 22.5 W/cm² at 405 nm.

Preproduction quantities of the DLP991UUV are available now on TI.com.

DLP991UUV product page 

Texas Instruments 

The post DMD powers high-resolution lithography appeared first on EDN.

2 October 2025
http://institutionofelectronics.ac.uk/wp-content/uploads/2022/12/IOE_LOGO.png 0 0 whdsolutions http://institutionofelectronics.ac.uk/wp-content/uploads/2022/12/IOE_LOGO.png whdsolutions2025-10-02 20:15:592025-10-02 20:15:59DMD powers high-resolution lithography

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